发明名称 Method and apparatus for analysis of semiconductor materials using photoacoustic spectroscopy techniques
摘要 A photoacoustic spectrometer apparatus adapted to enable an observation and characterisation of non-radiative sub bandgap defects in narrow and large bandgap materials using photoacoustic spectroscopy techniques, the apparatus providing for an irradiation of a sample material provided within a photoacoustic cell and the subsequent detection and processing of an acoustic signal emitted by the sample, the apparatus comprising a light source having a polychromatic output substantially in the photonic energy range 0.5 eV to 6.2 eV, focusing means adapted to couple the output from the light source onto the sample material, the focusing means providing for an alignment and focusing of the light emitted from the light source so as to provide a substantially parallel incident light onto the sample material, and means for detecting and acquiring the acoustic signal emitted by the sample in response to the irradiation. A method of providing an acoustic signal spectrum emitted by a sample material provided within a photoacoustic cell following irradiation of the sample by an incident light beam is also provided.
申请公布号 US2006256339(A1) 申请公布日期 2006.11.16
申请号 US20040557950 申请日期 2004.05.21
申请人 LOWNEY DONNACHA;MCNALLY PATRICK;READER ALEC 发明人 LOWNEY DONNACHA;MCNALLY PATRICK;READER ALEC
分类号 G01N21/00;G01N21/17 主分类号 G01N21/00
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