发明名称 |
Methods of fabricating nano-scale and micro-scale mold for nano-imprint, and mold usage on nano-imprinting equipment |
摘要 |
To provide a metal mold excellent in the mold-release characteristic and the transfer accuracy in a nano-imprint method. By controlling the thickness of a metal oxide film formed in the face of a release agent and a mold, the adhesive amount of the release agent layer formed in the outer layer thereof is adjusted, thereby forming a mold excellent in the mold-release characteristic. The present invention also relates to methods of fabricating molds for nano-imprint, and mold usage on nano-imprinting equipment.
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申请公布号 |
US2006258163(A1) |
申请公布日期 |
2006.11.16 |
申请号 |
US20060354029 |
申请日期 |
2006.02.15 |
申请人 |
OHASHI KENYA;MIYAUCHI AKIHIRO;OGINO MASAHIKO |
发明人 |
OHASHI KENYA;MIYAUCHI AKIHIRO;OGINO MASAHIKO |
分类号 |
B81C99/00;H01L21/302;B29C33/38;B29C59/02;G11B5/84;H01L21/027 |
主分类号 |
B81C99/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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