发明名称 Methods of fabricating nano-scale and micro-scale mold for nano-imprint, and mold usage on nano-imprinting equipment
摘要 To provide a metal mold excellent in the mold-release characteristic and the transfer accuracy in a nano-imprint method. By controlling the thickness of a metal oxide film formed in the face of a release agent and a mold, the adhesive amount of the release agent layer formed in the outer layer thereof is adjusted, thereby forming a mold excellent in the mold-release characteristic. The present invention also relates to methods of fabricating molds for nano-imprint, and mold usage on nano-imprinting equipment.
申请公布号 US2006258163(A1) 申请公布日期 2006.11.16
申请号 US20060354029 申请日期 2006.02.15
申请人 OHASHI KENYA;MIYAUCHI AKIHIRO;OGINO MASAHIKO 发明人 OHASHI KENYA;MIYAUCHI AKIHIRO;OGINO MASAHIKO
分类号 B81C99/00;H01L21/302;B29C33/38;B29C59/02;G11B5/84;H01L21/027 主分类号 B81C99/00
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