发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 A photosensitive resin composition containing at least thermoplastic elastomer (a), photopolymerizable unsaturated monomer (b) and photopolymerization initiator (c), characterized in that the thermoplastic elastomer (a) contains at least a vinyl aromatic hydrocarbon unit, a butadiene unit and an alkylene unit, the alkylene unit amounting to 5 to 80 wt.% based on the total amount of butadiene unit and alkylene unit. This photosensitive resin composition simultaneously satisfies the requirement of excellent fine line reproducibility, resistance to ester solvents and printing surface cracking prevention.
申请公布号 WO2006120935(A1) 申请公布日期 2006.11.16
申请号 WO2006JP308946 申请日期 2006.04.28
申请人 ASAHI KASEI CHEMICALS CORPORATION;FUJIWARA, MASAHIRO;DOI, KENJI;ARAKI, YOSHIFUMI;YAMAZAWA, KAZUYOSHI 发明人 FUJIWARA, MASAHIRO;DOI, KENJI;ARAKI, YOSHIFUMI;YAMAZAWA, KAZUYOSHI
分类号 G03F7/033;G03F7/00 主分类号 G03F7/033
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