发明名称 |
APPARATUS FOR SPUTTERING THIN FILM |
摘要 |
A thin film deposition apparatus capable of preventing thin films with irregular thicknesses from being formed on substrates by characteristics of a film thickness sensor is provided. A thin film deposition apparatus comprises: a deposition chamber; a substrate mounting part disposed in an upper part within the deposition chamber; a crucible which is disposed in a lower part within the deposition chamber, and in which a deposition material is filled; a film thickness sensor(50) having plural crystal sensors(58) to sense a film thickness of the deposition material that is evaporated in the crucible and deposited on a substrate of the substrate mounting part; and a control part for outputting a sensor exchange signal for exchanging a crystal sensor that needs to be exchanged, and controlling a deposition temperature by receiving an electric signal from the crystal sensors to maintain a thin film deposition ratio to a set value. The film thickness sensor comprises: a sensor installation frame(52) mounted in the chamber; a chopper installation frame(54) formed on the sensor installation frame; a chopper(56) and a motor(M2) installed on the chopper installation frame.
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申请公布号 |
KR100649200(B1) |
申请公布日期 |
2006.11.16 |
申请号 |
KR20050111659 |
申请日期 |
2005.11.22 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
LEE, JEONG YEOL;SHIM, SANG JIN;CHOI, YONG JOONG;KIM, JAE JUNG;KIM, HYUNG MIN |
分类号 |
C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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