发明名称 QUARTZ PLATE FOR THICKNESS-SHEAR VIBRATOR
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a quartz element plate for maintaining and assuring successful temperature characteristics while satisfying a surface state corresponding to a requested frequency in manufacturing of a crystal vibrator. <P>SOLUTION: A quartz plate of which the surface state is smoothed so that surface roughness and intervals of irregularity on the surface become less than wavelength of vibration on the crystal surface of a vibrator to be used is provided. The quartz plate is obtained by performing wet etching consisting of a first etching process of wrapping the surface of, for example, a crystal wafer at predetermined thickness and using a first etching compound which makes buffered hydrofluoric acid the main component or is obtained by adding strong acid of equimolar or less to hydrofluoric acid and a second etching process of using the hydrofluoric acid with concentration of 15 weight%≤60 weight% or a second etching compound by adding ammonium fluoride to the hydrofluoric acid by equimolar to the wafer or the crystal element plate made into individual plates from the wafer. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2006314123(A) 申请公布日期 2006.11.16
申请号 JP20060175794 申请日期 2006.06.26
申请人 SEIKO EPSON CORP 发明人 FUNATSU MORIMASA;NAKAGAWA TETSUO
分类号 H03H3/02;H01L41/18;H01L41/332;H01L41/337;H01L41/39;H03H9/19 主分类号 H03H3/02
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