| 摘要 |
A focus ring fixing structure of a plasma generating apparatus is provided to reduce the number of PMs(Preventive Maintenances) and to prevent the leak of a cooling gas due to a lifting phenomenon by using a polymer storing space. A plasma generating apparatus comprises an electrostatic chuck(31) for holding a wafer and a focus ring(32) for being connected with the electrostatic chuck along a peripheral portion. A stepped portion is formed on the electrostatic chuck to load stably the focus ring. The focus ring has a negative slope(321), so that a predetermined space(311) capable of storing polymer is formed between the negative slope and the stepped portion.
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