发明名称 |
MULTI-LEVEL TYPE NON-VOLATILE MEMORY DEVICE |
摘要 |
<p>A multi-level type nonvolatile memory device is provided to restrain the distortion of data due to the leak of charge and to improve retention characteristics by controlling properly a tunneling probability using an improved barrier insulating layer structure composed of a plurality of barrier insulating layers with different tunneling characteristics. Source/drain regions(52) are formed in a semiconductor substrate(50). A gate electrode(64) is formed between the source/drain regions on the substrate. A tunnel insulating layer(54) and a blocking insulating layer are interposed between the substrate and the gate electrode. A plurality of charge storing layers(56a,56b,56c) are stacked between the blocking insulating layer and the tunnel insulating layer. A plurality of barrier insulating layers(58,60) are interposed between the charge storing layers.</p> |
申请公布号 |
KR20060116543(A) |
申请公布日期 |
2006.11.15 |
申请号 |
KR20050038992 |
申请日期 |
2005.05.10 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HOU ZONG LIANG;BAIK, SEUNG JAE;YEO, IN SEOK;YOON, HONG SIK;KIM, SHI EUN |
分类号 |
H01L27/115 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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