| 摘要 |
<p>A photo mask is provided to prevent the generation of a process failure by detecting easily exactly an abnormal loading state of the photo mask itself by using an asymmetric arrangement of a plurality of align marks. A photo mask includes a rectangular type exposure unit, a light shielding unit, and a plurality of align marks. The rectangular type exposure unit(22) is used for performing an exposure process on a chip die. The light shielding unit(20) encloses the rectangular type exposure unit in order to shield the light. The plurality of align marks(24) are arranged at each corner of the light shielding unit. The arrangement of the align marks is formed like an asymmetric structure.</p> |
