发明名称 |
LINE PROFILE ASYMMETRY MEASUREMENT |
摘要 |
This disclosure provides methods for measuring asymmetry of features, such as lines of a diffraction grating. On implementation provides a method of measuring asymmetries in microelectronic devices by directing light at an array of microelectronic features of a microelectronic device. The light illuminates a portion of the array that encompasses the entire length and width of a plurality of the microelectronic features. Light scattered back from the array is detected. One or more characteristics of the back-scattered light may be examined by examining data from complementary angles of reflection. This can be particularly useful for arrays of small periodic structures for which standard modeling techniques would be impractically complex or take inordinate time.
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申请公布号 |
KR20060116797(A) |
申请公布日期 |
2006.11.15 |
申请号 |
KR20067005109 |
申请日期 |
2006.03.13 |
申请人 |
ACCENT OPTICAL TECHNOLOGIES, INC. |
发明人 |
RAYMOND CHRIS |
分类号 |
G01J3/24;G01B;G01B11/02;G01B11/24;G01B11/30;G01J3/42;G01N21/88 |
主分类号 |
G01J3/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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