| 摘要 |
A wafer cooling station of heat treatment equipment is provided to prevent the damage of a wafer due to the impact between the wafer and an inner wall of the wafer cooling station by detecting previously the deviation of the wafer using a wafer detecting sensor. A wafer cooling station of heat treatment equipment comprises a body(110) with a first cooling water circulating path, a cooling water inlet port(140) connected to an upper portion of the body, a cooling water outlet port(150) connected to a lower portion of the body, a plurality of wafer stages(120) with a second cooling water circulating path corresponding to the first cooling water circulating path, a plurality of wafer support pins for supporting a wafer on the wafer stage, a cover(130) for covering the body, and a wafer detecting sensor. The wafer detecting sensor is used for detecting the deviation of the wafer.
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