发明名称 |
Multi-step phase shift mask and methods for fabrication thereof |
摘要 |
A phase shift mask comprises a transparent substrate having a patterned opaque material layer formed thereupon to form a non-transmissive region of the transparent substrate and an adjoining transmissive region of the transparent substrate. A pit is formed within the transmissive region of the transparent substrate. The pit has a stepped sidewall such as to provide the phase shift mask with enhanced optical performance. The phase shift mask may be fabricated employing a self aligned method.
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申请公布号 |
US7135257(B2) |
申请公布日期 |
2006.11.14 |
申请号 |
US20030693989 |
申请日期 |
2003.10.22 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD |
发明人 |
LU MING;CHANG BIN-CHANG;KUNG LI-WEI |
分类号 |
G01F9/00;G03C5/00;G03F1/00;G03F9/00 |
主分类号 |
G01F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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