发明名称 PELLICLES HAVING LOW ADHESIVE RESIDUE
摘要 <p>A pellicle is provided to reduce the contamination by using an improved mask adhesive made of an acryl based emulsion adhesive. A pellicle includes a frame, a pellicle layer, and a mask adhesive layer. The pellicle layer is formed on one end portion of the frame via a film adhesive. The mask adhesive layer is formed on the other end portion of the frame in order to attach the pellicle itself to a predetermined mask. The pellicle is attached to a quartz glass. Then, the pellicle is removed from the quartz glass. At this time, the mask adhesive layer of the pellicle remains within 5% of the quartz glass area. The mask adhesive layer is made of an acryl based emulsion adhesive.</p>
申请公布号 KR20060116152(A) 申请公布日期 2006.11.14
申请号 KR20060039771 申请日期 2006.05.03
申请人 MITSUI CHEMICALS, INC. 发明人 HARUBAYASHI KATSUAKI;FUJITA MINORU;KONDOU MASAHIRO;SAIMOTO YOSHIHISA
分类号 H01L21/027;G03F1/62 主分类号 H01L21/027
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