发明名称 Fluxless bumping process
摘要 A process including providing a semiconductor device including a bond pad, and an under bump metallurgy overlying the bond pad. Forming a solder structure over the under bump metallurgy, and wherein the solder structure includes an outer layer including tin oxide. Producing a plasma from at least one of CF<SUB>4 </SUB>and SF<SUB>6</SUB>, and exposing the solder structure to the plasma. Heating the solder structure and cooling the same to provide a solder bump on the semiconductor device.
申请公布号 US7134199(B2) 申请公布日期 2006.11.14
申请号 US20020170745 申请日期 2002.06.13
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 SU CHAO-YUAN;LIN CHIA-FU;LEE HSIN-HUI;CHEN YEN-MING;CHING KAI-MING;CHEN LI-CHIH;KUO WEN-CHANG;JIAN YUE-YING
分类号 H01R9/00;H01L21/60;H01L23/485;H05K3/00 主分类号 H01R9/00
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