| 摘要 |
The system has at least one light source (1), at least one first mirror or lens divided into first raster elements (5) and one or more optical elements between the at least one mirror or lens and a reticle plane (14). The first raster element of the at least one mirror or lens divides a beam incident on the mirror or lens into sub-beams and deflects them through a first angle, whereby the first deflection angles of at least two sub-beams are different. Independent claims are also included for the following: (a) a projection illumination system for microlithography (b) and a method of manufacturing microelectronic components with an inventive projection illumination system. |
