WIRING STRUCTURE OF A SEMICONDUCTOR PACKAGE, METHOD OF MANUFACTURING THE WIRING STRUCTURE AND WAFER LEVEL PACKAGE USING THE WIRING STRUCTURE, AND METHOD OF MANUFACTURING THE WAFER LEVEL PACKAGE

摘要

An interconnection structure of a semiconductor package is provided to more simplify the fabricating process of an interconnection structure by forming a contact hole for exposing an interconnection on a photoresist pattern without removing a preliminary photoresist structure from a conductive pattern such that the preliminary photoresist structure is disposed on the conductive pattern to form a conductive pattern connected to a pad. A pad(110) inputs a signal to a circuit part(105) or outputs a signal from the circuit part, disposed on a body(102) with the circuit part. A conductive pattern(120) is disposed on the upper surface of the body, electrically connected to the pad. An insulating photoresist structure(130) is formed on the upper surface of the conductive pattern, having a contact hole for exposing a part of the upper surface of the conductive pattern. The insulating photoresist structure has substantially the same outer shape as the conductive pattern.