发明名称 MEMORY LOCATION
摘要 FIELD: microelectronics; memory device manufacture. ^ SUBSTANCE: novelty is that insulator layer in proposed memory location whose storage element incorporates first electrode, second electrode, and insulator layer disposed between mentioned electrodes is made of N > 1 separate polymeric films of essentially equal thickness d < 80 mum produced from same material and in similar way, and piled. ^ EFFECT: enhanced insulator capability of charging and holding electric charges between electrodes. ^ 3 cl, 1 dwg
申请公布号 RU2287206(C2) 申请公布日期 2006.11.10
申请号 RU20040131058 申请日期 2004.10.26
申请人 TSOJ BRONJA 发明人 TSOJ BRONJA;LAVRENT'EV VLADIMIR VLADIMIROVICH;KARTASHOV EHDUARD MIKHAJLOVICH;SHEVELEV VALENTIN VLADIMIROVICH
分类号 H01L27/115 主分类号 H01L27/115
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