| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a simple method of manufacturing a processed substrate in which a substrate is integrated with a resist film having a highly accurate desired resist pattern and excellent in etching durability. <P>SOLUTION: In the method of manufacturing a processed substrate, following steps are successively executed: a step of combining the substrate and a mold having a pattern reverse to the desired resist pattern on its surface, thereby sandwiching a resist composition containing a fluorine-containing surfactant and a polymeric monomer having a ring structure or a polymeric monomer forming a ring structure by polymerization between the substrate surface and the pattern surface of the mold; a step of polymerizing the polymeric monomer in the resist composite to form a resist film from the composite; and a step of separating the mold from the resist film to obtain a processed substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
