| 摘要 |
PROBLEM TO BE SOLVED: To provide a glow discharge emission spectrophotometer and a method capable of accurate analysis, even when the thickness of a thin film is extremely thin relative to the sample having the thin film on a substrate, where the surface of the substrate or the thin film has a mirror-surface shape. SOLUTION: This spectrophotometer is equipped with a reference data storage means 31 for storing measured intensity, having one or more periods of periodical changes which is measured intensity with respect to a sputtering time relative to a specific element, in a thin film 17 of a reference sample 16, having the thin film 17 of the same type as the thin film 7 of an analysis object sample 6; and a correction means 32 wherein the measured intensity to the sputtering time is determined relative to the specific element in the thin film 7 of the analysis object sample 6, and the ratio of the measured intensity relative to the specific element in the thin film 7 of the analysis object sample 6 to the measured intensity, relative to the specific element in the thin film 17 of the reference sample 16, is calculated with respect to the sputtering time, and the result is used as corrected measured intensity to the sputtering time relative to the specific element in the thin film 7 of the analysis object sample 6. COPYRIGHT: (C)2007,JPO&INPIT
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