| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and method for forming a functional film pattern which enable a pattern to be surely fired and to have prescribed electric characteristics, and to provide electronic equipment. SOLUTION: An electromagnetic wave W1 for detection is emitted to an irradiation zone A of a film pattern 40A to be irradiated with a laser beam 50 for firing and the reflected wave W2 of the electromagnetic wave W1 is detected, the electromagnetic wave W1 for detection having a wavelength which is different from that of a laser beam 50 for firing and is absorbed by the film pattern 40A but is not absorbed by a wiring pattern 40B. When the reflected wave W2 having intensity≤20% of that of the electromagnetic wave W1 for detection is detected, the irradiation zone A is irradiated with the laser beam 50 for firing continuously, and when the reflected wave W2 having intensity larger than 20% of that of the electromagnetic wave W1 for detection is detected, a carriage 21 is moved to irradiate the next irradiation zone with the laser beam 50 for firing. COPYRIGHT: (C)2007,JPO&INPIT
|
