发明名称 |
Substrate carrying apparatus, exposure apparatus, and device manufacturing method |
摘要 |
A substrate carrying apparatus, comprises: a first carrying mechanism that carries a substrate into an exposure processing unit that performs exposure processing via a projection optical system and a liquid; a second carrying mechanism that carries a substrate from the exposure processing unit; and an anti-scattering mechanism that controls scattering of the liquid from at least one of the second carrying mechanism and the substrate carried by the second carrying mechanism to at least one of the first carrying mechanism and the substrate carried by the first carrying mechanism.
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申请公布号 |
US2006250602(A1) |
申请公布日期 |
2006.11.09 |
申请号 |
US20060398598 |
申请日期 |
2006.04.06 |
申请人 |
NIKON CORPORATION |
发明人 |
SATO KEI;HORIUCHI TAKASHI |
分类号 |
G03B27/58;G03F7/20;H01L21/00;H01L21/027;H01L21/677 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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