发明名称 |
Flexible photomask for photolithography, method of manufacturing the same, and micropatterning method using the same |
摘要 |
Provided are a flexible photomask for photolithography, a method of manufacturing the same, and a patterning method using the same. The flexible photomask is made of a light-transmissive elastomer and has a patterned surface.
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申请公布号 |
US2006251972(A1) |
申请公布日期 |
2006.11.09 |
申请号 |
US20060324211 |
申请日期 |
2006.01.03 |
申请人 |
LEE TAE-WOO |
发明人 |
LEE TAE-WOO |
分类号 |
G03F1/54;G03F1/56;G03F1/68;G03F7/20;H01L21/027 |
主分类号 |
G03F1/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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