发明名称 Flexible photomask for photolithography, method of manufacturing the same, and micropatterning method using the same
摘要 Provided are a flexible photomask for photolithography, a method of manufacturing the same, and a patterning method using the same. The flexible photomask is made of a light-transmissive elastomer and has a patterned surface.
申请公布号 US2006251972(A1) 申请公布日期 2006.11.09
申请号 US20060324211 申请日期 2006.01.03
申请人 LEE TAE-WOO 发明人 LEE TAE-WOO
分类号 G03F1/54;G03F1/56;G03F1/68;G03F7/20;H01L21/027 主分类号 G03F1/54
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