| 摘要 |
<p>A lithographic apparatus and a device manufacturing method are provided to prevent vapors from being generated, such that imaging defects due to the vapors are reduced. A lithographic apparatus is configured to project an image of a desired pattern on a substrate, which is supported on a substrate table(WT), through predetermined solution. A gap is formed inside a surface of the substrate table between the substrate table and an outer edge of a substrate. Alternatively, the gap is formed between a region, where the solution is contacted, and the substrate table. A vapor containing device, which is configured to contain possible vapors therein, is provided inside the gap. The vapor containing device includes plural hair portions, which have a contact angle higher than 90 degree.</p> |
