| 摘要 |
Methods of cleaning immersion exposure tools using ultrasonic waves and systems thereof are disclosed. An ultrasonic wave generator is coupled to the fluid of an immersion exposure tool, or to a component that makes contact with the fluid. The ultrasonic wave generator is activated, generating ultrasonic waves in the fluid that dislodge debris and particulates, cleaning the immersion exposure tool. The ultrasonic wave generator may be activated during an exposure process to vary the distance between the lens system and the wafer, increasing the process window.
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