发明名称 METHOD FOR FORMING MULTILAYER FILM, OPTICAL COMPONENT, OPTICAL HEAD AND OPTICAL RECORDING/REPRODUCING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To inexpensively form a multilayer film with desired film thickness at high precision even in the case a general film deposition system is used. <P>SOLUTION: The method for forming a multilayer film comprises: a first layer film formation stage where a high refractive index film 4a is formed on an optical substrate 2 with the film thickness upon the designing is as the controlled film thickness; and an upper layer film formation stage where, on the formed film, a low refractive index film 5a or 5b and a high refractive index film 4a or 4b are formed with the film thickness in the prescribed ratio of the film thickness upon designing of the low refractive index film 5a or 5b and the high refractive index film 4a or 4b as the controlled film thickness. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006307250(A) 申请公布日期 2006.11.09
申请号 JP20050128796 申请日期 2005.04.27
申请人 TDK CORP 发明人 MURATA HIDEJI;OIKAWA SHINJI
分类号 C23C14/54;C23C14/48;G02B1/11;G02B5/26;G02B5/28;G11B7/22 主分类号 C23C14/54
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