| 摘要 |
PROBLEM TO BE SOLVED: To provide a dry etcher which uniformly etches a plurality of substrates. SOLUTION: The dry etcher comprises an evacuatable chamber 5, a chemical species generating source 2 mounted in the chamber 5 for generating a chemical species 3 having etching actions, and a substrate holder 1 disposed in the chamber 5 for holding a plurality of substrates 4 under process to expose them to the chemical species 3, thereby etching the surface of each substrate. The holder 1 has a shape capable of holding the plurality of substrates 4 so as to conform with the density distribution of the chemical species 3 having the etching action, thereby making the etching process of each substrate 4 uniform. The holder 1 has, e.g., a dome-like shape forming a part of a symmetric body of revolution of a circle, ellipse, or a hyperbola or parabola. COPYRIGHT: (C)2007,JPO&INPIT
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