SUBSTRATE PROCESSING EQUIPMENT AND METHOD

摘要

PROBLEM TO BE SOLVED: To provide substrate processing equipment and method in which the components of a processing liquid on a substrate can be prevented from eluting into a liquid in an aligner.

SOLUTION: The substrate processing equipment 500 comprises an indexer block 9, an anti-reflection film processing block 10, a resist film processing block 11, a development processing block 12 and an interface block 13. An aligner 14 is arranged contiguously to the interface block 13. The interface block 13 includes a cleaning section 95 and a carrying mechanism IFR for interface. Before the substrate W is exposed in the aligner 14, the substrate W is carried by the carrying mechanism IFR for interface to the cleaning processing section 95 where the substrate W is cleaned and dried.

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