| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a slurry for a metal film CMP to polish the metal film stably and evenly at a low friction without causing a defect on the metal film and an insulating film. <P>SOLUTION: The slarry for the metal film CMP has water, polyvinyl pyrrolidone with weight-average molecular weight 20,000 or higher compounded in 0.01 wt.% or more and 0.3 wt.% or less of a total volume, an oxidizing agent, a protective coat forming agent including a first complex forming agent to form a water-insoluble complex, and a second complex forming agent to form a water-soluble complex, and a colloidal silica with a primary particle diameter of 5 to 50 nm are contained. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
