发明名称 Edge exposure apparatus, coating and developing apparatus, and edge exposure method
摘要 The present invention includes a first and a second optical path forming member arranged within a path of light beams from a light source; a first mounting table provided such that the edge portion of the substrate is located within an application region of the light beams from an outlet side of the first optical path forming member, and a second mounting table provided such that the edge portion of the substrate is located within an application region of the light beams from an outlet side of the second optical path forming member, each of the mounting tables being configured to be rotatable about a vertical axis while mounting the substrate thereon; and a light blocking means for blocking application of light from each of the first and second optical path forming members. A common light source can be used to perform edge exposure for the substrates on the first and second mounting tables, for example, at the same time, so that a high processing ability can be offered and an increase in size of the apparatus can be prevented.
申请公布号 US2006250594(A1) 申请公布日期 2006.11.09
申请号 US20060417163 申请日期 2006.05.04
申请人 TOKYO ELECTRON LIMITED 发明人 IWASHITA YASUHARU;SHIMOMURA ICHIRO
分类号 G03B27/42 主分类号 G03B27/42
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