| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a retardation plate, in which the characteristic changes and film stripping will not be caused, even in a high-temperature/high-humidity environment and reliability as, to thermal shocks, and high optical efficiency is ensured and the element can be made thin. SOLUTION: A substrate 1, for forming a wavelength plate cured by irradiating oriented photosetting liquid crystal resin 3 with UV rays, is heat-treated, and thereafter, non-reflection coat 4 is formed by vacuum deposition through ion beam assist. COPYRIGHT: (C)2007,JPO&INPIT
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