发明名称 METHOD OF FORMING LAMINATED FILM
摘要 PROBLEM TO BE SOLVED: To provide a simple method for forming a laminated film made of a silicon film and a silicon oxide film on a substrate. SOLUTION: By the method of forming the laminated film, the laminated film made of a silicon film and a silicon oxide film is formed on the substrate from a composition for film formation containing a silane compound and a solvent. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006310345(A) 申请公布日期 2006.11.09
申请号 JP20050127473 申请日期 2005.04.26
申请人 JSR CORP 发明人 IWAZAWA HARUO;O DOUKAI;MATSUKI YASUO
分类号 H01L21/208;H01L21/316;H01L21/336;H01L29/786 主分类号 H01L21/208
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