| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold using a photoresist hard to cause the occurrence of a shape change or a flaw even if the photoresist is irradiated with ultraviolet rays. SOLUTION: First, a substrate 1 comprising quartz, silicon or the like is coated with the photoresist 2 (a), a convex lens-like pattern is formed on the photoresist 2 by a photolithographic process (b) and an Ni thin film 3 is formed on the surface of the photoresist 2 by sputtering to complete the mold 4. Succeedingly, an ultraviolet curable resin 5 is dripped on the mold 4 (d). Then, a glass substrate 6 is pressed to the surface of the ultraviolet curable resin 5 and the ultraviolet curable resin 5 is irradiated with ultraviolet rays through the glass substrate 6 to be cured (e). The intensity of ultraviolet rays transmitted through the Ni thin film 3 becomes weak and the foaming or deformation shrinkage of the photoresist 2 is not caused by such intensity. COPYRIGHT: (C)2007,JPO&INPIT
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