| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor having a processing chamber for storing therein a substrate; a susceptor laid in the processing chamber; a radiation-temperature gauge so provided in the space of the processing chamber as to be present on the front-surface side of a substrate, when mounting the substrate on the susceptor and for sensing the temperature of the substrate; and a heating means so provided in the space of the processing chamber as to be present on the rear-surface side of the substrate, which suppresses or prevents the light radiated from the heating means from affecting the temperature measuring value of the radiation-temperature gauge, and can suppress the unevenness of the heating of the substrate. SOLUTION: In the substrate processor, a light shading member for shading the light radiated from its heating means is so provided on the surface of its susceptor as to overlap with the peripheral portion of the front-surface side of a substrate in a non-contacting way, and the substrate is supported by a supporting member extended from its susceptor. COPYRIGHT: (C)2007,JPO&INPIT
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