MANUFACTURING METHOD OF CATCH CUP, CATCH CUP MANUFACTURED BY THE METHOD, AND PHOTH RESIST COATING APPARATUS OF WAFER

摘要

A method for manufacturing a catch cup, the catch cup manufactured thereby and a photoresist coating apparatus are provided to prolong a replacement cycle by reducing remarkably residues of photoresist on an inner wall of the catch cup using a predetermined coating layer with a low wettability against the photoresist. A base frame(11) with a predetermined shape is prepared. A predetermined coating layer(12) is formed on at least one region of the surface of the base frame. The predetermined coating layer has a low wettability against photoresist. The predetermined coating layer includes one selected from a group consisting of a silicon coating layer.