发明名称 SUBSTRATE HOLDING TOOL
摘要 PROBLEM TO BE SOLVED: To facilitate the separation between a substrate holder and a mask holder in a substrate holding tool capable of film deposition in an optional pattern to a substrate through a mask, and to correctly arrange the mask to the substrate with high reproducibility. SOLUTION: A substrate holder 2 holding a substrate S and a mask holder 3 having an opening part 21 to which the substrate faces, and in which a mask M is mounted on the opening part freely attachably and detachably are engaged, so as to compose a substrate holding tool 1. In this case, either the substrate holder or the mask holder is provided with one pin 26 projecting toward the other, further, a pin hole 37 into which the pin is inserted is formed on the other, a part of the circumferential face of the substrate holder and the mask holder at which the substrate holder and the mask holder are engaged is made into taper faces 25, 36 corresponding each other, respectively. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006307246(A) 申请公布日期 2006.11.09
申请号 JP20050127841 申请日期 2005.04.26
申请人 ULVAC JAPAN LTD;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 FURUSE HARUKUNI;UCHIYAMA TOYOJI;YAMADA TOMOHIRO;SOTOOKA KAZUHIKO;KIKUCHI NAOTO
分类号 C23C14/04 主分类号 C23C14/04
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