| 摘要 |
A method for forming a field emission cathode device is disclosed using a peelable photoresist with standard photolithography processes for patterning a deposition mask, except that the peelable photoresist can be peeled away in dry form. The method offers standard photoresist accuracy with the advantage of high patterning resolution for producing carbon nanotube (CNT) field emitter displays. Example methods using a single peelable photoresist layer, and using two distinct layers of photoresist and peelable film, are presented. Since the method does not require wet processes after CNT deposition, it ensures enhanced CNT emitter performance. In addition, an activation process that liberates CNTs can be performed just before a tape lamination and peeling process step. In this manner, all superfluous nanoparticle material remains confined between the tape and photoresist films, which are removed together and properly discarded.
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