| 摘要 |
<p>This invention provides an antistatic resin composition comprising (a) 100 parts by weight of a polyacrylonitrile resin and, blended with the polyacrylonitrile resin, (b) 3 to 10 parts by weight of a graft copolymer prepared by graft polymerizing an ethylenically unsaturated monomer onto an alkylene oxide group-containing rubbery stem polymer, (c) 3 to 10 parts by weight of a hydrophilic polymer compatible with a polyacrylonitrile resin (a), and (d) 0.01 to 5 parts by weight of a surfactant. This composition is suitable for the formation of a vessel suitable for storing precision products, which are produced in a very small amount but are required to have high antistatic properties, such as photomasks, or semi-finished products thereof. There is also provided a kit for the preparation of an antistatic resin vessel comprising the antistatic resin composition and acetonitrile as a solvent.</p> |
