| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a low-reflectivity film, a paint for forming the low-reflectivity film, and a base material with the low-reflectivity film having low-haze, luminous efficacy reflectance of 1.5% or lower and superior scratch resistance, by using a porous silica that is a low-refractive index filler. <P>SOLUTION: The porous silica 4, having a hole 5 formed therein, is dispersed into a high-molecular weight silicon compound 3, covering an open end of the hole or the porous silica, is dispersed into a low-molecular weight silicon compound, having a molecular weight smaller than that of the high-molecular weight silicon compound, where the high-molecular weight silicon compound that covers the open end of the hole is contained. By doing so, the haze of the low-reflectivity film becomes low, the luminous efficacy reflectance of 1.5% or lower is provided; and moreover, effects superior in the scratch resistance are obtained. <P>COPYRIGHT: (C)2007,JPO&INPIT |
