| 摘要 |
PROBLEM TO BE SOLVED: To form a thick wiring film even by ink jet coating using ink containing low-density metal as to a method for manufacturing an active matrix type liquid crystal display device employing an ink jet method using a thin-film transistor. SOLUTION: The ink 101' of the ink jet coating method is dripped in an opening portion of a light transmission type photosensitive resin 52 formed having two gate wiring lines 101 arranged adjacently, the solvent of the ink 101' is vaporized and dried to separate the ink 101' along a discard region 52' as a boundary, and the separated ink 101'' is dried and burnt to form the gate wiring lines 101 which are≥2 times as thick as conventional wiring lines. COPYRIGHT: (C)2007,JPO&INPIT |
