| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming apparatus of high accuracy and low cost, as well. SOLUTION: A comb-type part having a beveled part 6 and a pattern guide groove 5 are formed by a photolithographic process from the mother material of a silicon single crystal of a side direction (100). A liquid storing part 7 which stores a pattern material uniformly in each comb-tooth part 4 of the comb-type part 3 is formed in the same process of the guide groove. At forming of the beveled part 6, a wet anisotropic etching is performed, and the difference in the etching speeds of a side direction is utilized, then a beveled part, having a side direction (111) with respect to the side direction (100) can be formed easily at high accuracy, and the groove part 5 can be formed by anisotropic dry etching, and a pattern material guiding groove, having a perpendicular sidewall which reaches the beveled part, can be formed. COPYRIGHT: (C)2007,JPO&INPIT
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