| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target for depositing a Co-based magnetic film having excellent coercive force and less medium noise by the sputtering method. SOLUTION: The sputtering target comprises a fine homogeneous dispersion mixed phase of an alloy phase consisting of at least one kind of metal elements of chromium, nickel, tantalum, and platinum and the balance a cobalt alloy, and a ceramic phase consisting of a compound of at least one kind of elements of oxygen, nitrogen and carbon, and at least one kind of elements of silicon, aluminum, boron, titanium and zirconium which have affinity to these elements. COPYRIGHT: (C)2007,JPO&INPIT
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