| 摘要 |
PROBLEM TO BE SOLVED: To provide a continuous film-forming apparatus for continuously cleaning a substrate and forming an oxide thin-film thereon with an ozone-introducing means, and to provide a method threrefor. SOLUTION: The continuous film-forming apparatus has a vacuum chamber provided with an exhausting means, a film-forming means for depositing a film-forming material on the substrate surface, a transporting means for sequentially supplying the substrate to a film-forming position which faces the film-forming means, and the ozone-introducing means for spraying ozone on the substrate surface, wherein the ozone is sprayed onto the substrate with the use of the ozone-introducing means, right before the substrate is supplied to the film-forming position. COPYRIGHT: (C)2007,JPO&INPIT
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