发明名称 Memory element and its method of formation
摘要 A method for controlling silver doping of a chalcogenide glass in a resistance variable memory element is disclosed herein. The method includes forming a thin metal containing layer having a thickness of less than about 250 Angstroms over a second chalcogenide glass layer, formed over a first metal containing layer, formed over a first chalcogenide glass layer. The thin metal containing layer preferably is a silver layer. An electrode may be formed over the thin silver layer. The electrode preferably does not contain silver.
申请公布号 US2006252176(A1) 申请公布日期 2006.11.09
申请号 US20060480412 申请日期 2006.07.05
申请人 MICRON TECHNOLOGY, INC. 发明人 MOORE JOHN T.;CAMPBELL KRISTY A.;GILTON TERRY L.
分类号 H01L21/06;C23C14/06;C23C16/30;H01L45/00 主分类号 H01L21/06
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