摘要 |
Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initiator. The oligomers can be included in photoresist compositions as dissolution rate modifiers. The photoresist compositions can further include a polymeric binder resin, a photoacid generator, and solvents. |
申请人 |
PROMERUS LLC;RHODES, LARRY, F.;SEGER, LARRY;GOODALL, BRIAN, L.;MCINTOSH, LESTER, H., III;DUFF, ROBERT, J. |
发明人 |
RHODES, LARRY, F.;SEGER, LARRY;GOODALL, BRIAN, L.;MCINTOSH, LESTER, H., III;DUFF, ROBERT, J. |