| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that allows an optical path space of exposure light to be filled with a liquid in a desired state even when a substrate is exposed to light while being moved. <P>SOLUTION: The exposure apparatus is provided with a liquid supply device adapted for supplying a liquid to fill an optical path space K1 of the exposure light with a liquid; a surface of a first land 75 adapted to hold, with a substrate, a liquid supplied from the liquid supply device, while being arranged to face the surface of a substrate disposed in the position to be irradiated with the exposure light and moreover, arranged so as to surround the optical path space K1 of the exposure light; and a surface of a second land 76 arranged to face the surface of the substrate and arranged on the outer sides of the surface of the first land 75 with respect to the optical path space K1 of the exposure light. The surface of the second land 76 is provided such that the membrane of the liquid lying between the surfaces of the substrate and second land 76 will not contact the surface of the second land 76. <P>COPYRIGHT: (C)2007,JPO&INPIT |
