| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for cleaning an optical component by which a contaminant sticking to the optical component constituting a projection optical system comprised in an immersion projection aligner is easily removed. <P>SOLUTION: This is the method for cleaning the optical component used for the immersion projection aligner in which a mask is irradiated with exposing light, and then the pattern of the mask is transferred to a substrate through the projection optical system, and purified water is interposed between the surface of the substrate and the projection optical system. The cleaning method comprises a substrate releasing process (S12) for making the substrate release from a substrate stage on which the substrate is placed, a purified water supplying process (S14) for supplying the purified water to the space between the substrate stage and the projection optical system, an irradiating process (S15) for, by supplying the purified water in the purified water supplying process, making into contact with the purified water and irradiating the optical component contact to liquid, which constitutes the projection optical system and is arranged on the side nearest to the substrate stage, with the exposing light, and a purified water discharging process (S16) for discharging the purified water supplied in the purified water supplying process. <P>COPYRIGHT: (C)2007,JPO&INPIT |
