发明名称 SUBSTRATE WASHING DEVICE
摘要 PROBLEM TO BE SOLVED: To realize washing of high quality by protecting the surface of a substrate to be processed, such as a glass substrate, from being damaged and preventing dust scraped once from the surface of the substrate to be processed from being restuck to the glass substrate. SOLUTION: A carried glass substrate is transferred to an inlet conveyer 1, and the surface of the glass substrate is hydrophilized by a surface processing unit 2. The glass substrate passed through the surface processing unit 2 is transferred to a low frequency BPP unit 3 arranged in an initial washing part 30. The low frequency BPP unit 3 provides mainly cavitaion action at an ultrasonic wave of 100 KHz and less to separate dust stuck to the surface of the glass substrate. The glass substrate is transferred to a washing part 40, and a high frequency BPP unit 4 generates mainly the acceleration of liquid molecule vibration at an ultrasonic wave of 900 KHz and more to remove the separated dust. The glass substrate passed through the high frequency BPP unit 4 is dried by a drying unit and transferred to a succeeding stage by an exit conveyer 6. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006310675(A) 申请公布日期 2006.11.09
申请号 JP20050133892 申请日期 2005.05.02
申请人 FUTURE VISION:KK 发明人 NAKADA MORIO
分类号 H01L21/304;G02F1/13;G02F1/1333;H01L21/677 主分类号 H01L21/304
代理机构 代理人
主权项
地址