发明名称 POLISHING PAD AND METHOD OF MAKING SAME
摘要 An article or polishing pad for altering a surface of a work piece includes a polymer matrix created by reaction injection molding of size controlled gas bubbles within a polyurethane matrix. The proposed liquid urethane precursor is first injected into an actuated mold and cured. The molded product is then removed from the mold and double side faced or ground to form a single thin polishing pad comprising a single layer of homogeneous material.
申请公布号 US2006252358(A1) 申请公布日期 2006.11.09
申请号 US20060459601 申请日期 2006.07.24
申请人 发明人 PRESTON SPENCER;HUTCHINS DOUG;HYMES STEVE
分类号 B23F21/03 主分类号 B23F21/03
代理机构 代理人
主权项
地址
您可能感兴趣的专利