发明名称 Device manufacturing method
摘要 A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as cyclooctane, decalin, bicyclohexyl, exo-tetrahydro-dicyclopentadiene and cyclohexane, another high-index hydrocarbon, a perfluoropolyether, such as perfluoro-N-methylmorpholine and perfluoro E2, a perfluoroalkane, such as perfluorohexane, or a hydrofluoroether; and water, respectively.
申请公布号 EP1720073(A1) 申请公布日期 2006.11.08
申请号 EP20060252280 申请日期 2006.04.28
申请人 ASML NETHERLANDS B.V. 发明人 STRAAIJER, ALEXANDER
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址