摘要 |
A semiconductor device manufacturing apparatus is provided to enhance manufacturing efficiency of the semiconductor device by enabling an operator to visually monitor a pressure variation inside a process chamber. A semiconductor device manufacturing apparatus includes a process chamber and a pressure display portion(108). The process chamber performs semiconductor device manufacturing processes. The pressure display portion displays a pressure inside the process chamber in real-time. The pressure is measured during the manufacturing process. The pressure display portion is implemented on an inner or outer portion of the semiconductor device manufacturing apparatus, such that an operator is enabled to remotely monitor the inner pressure of the process chamber.
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