CHAMBER SYSTEM FOR MEASURING OF GAS EMISSION VELOCITY BY SEMI-CONDUCTOR SENSOR

摘要

A chamber system for measuring a gas emission velocity with a semiconductor sensor is provided to calculate the diffusion speed and the discharge amount of foul odors and volatile organic materials to control the air pollution material. In a chamber system, the bottom surface of the chamber is formed of a slidably opened and closed door so as to inject a contamination gas into the chamber. A lower semiconductor gas sensor is installed at a central portion of the interior space by a chamber wall surface or a fixation unit. An upper semiconductor gas sensor is installed at a central portion of the interior space by a chamber wall surface or a fixation unit at a height from the lower semiconductor gas sensor.